In Situ Optical and Electrochemical AFM Monitoring of Cu Electrodeposition Process on Bare and (NH4)2S-Treated p-GaAs(001) Surfaces
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Title In Situ Optical and Electrochemical AFM Monitoring of Cu Electrodeposition Process on Bare and (NH4)2S-Treated p-GaAs(001) Surfaces Author(s) Tamura, Kazuhisa; Kondo, Toshihiro; Uosaki, Kohei Citation Journal of The Electrochemical Society, 147(9): 3356-3360 Issue Date 2000 Doc URL http://hdl.handle.net/2115/50236 Right © The Electrochemical Society, Inc. 2000. All rights reserved. Except as provided under U.S. copyright law, this work may not be reproduced, resold, distributed, or modified without the express permission of The Electrochemical Society (ECS). The archival version of this work was published in J. Electrochem. Soc. 2000 volume 147, issue 9, 3356-3360. Type article
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Electrodeposition of flattened Cu nanoclusters on a p-GaAs(001) electrode monitored by in situ optical second harmonic generation.
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